Scientists were able to 3D-print different microstructures inside live cells, including a delightfully tiny micro-elephant.

To print microscopic structures, scientists need to inject a liquid material called a photoresist into the cell. This special ...

For the first time, scientists have 3-D printed objects within living cells, including a 10-micrometer long elephant and tiny “barcodes” that could help track individual cells. Remarkably, many of the ...

Major players in the photoresist & photoresist ancillaries market are Tokyo Ohka Kogyo Co. Ltd., JSR Corporation, DuPont, Shin-Etsu Chemical Co. Ltd., Sumitomo Chemical Co. Ltd., Fujifilm Electronic ...

Amid tightening US and Dutch export controls on advanced semiconductor equipment, especially ASML's extreme ultraviolet (EUV) lithography systems, China's Tsinghua University has announced a ...

In a preprint paper shared via the arXiv, scientists in Slovenia announce that they managed to 3D print a tiny elephant figure inside a living cell. The cell survived the procedure and its immediate ...

No cleanroom, no photomask—just precision optics and photoresist. This DIY method brings semiconductor-scale patterning into ...

Since its invention in 1959, photoresist has been the most crucial process material for the semiconductor industry. Photoresist was improved as a key material used in the manufacturing process of ...

Major players in the photoresist & photoresist ancillaries market are Tokyo Ohka Kogyo Co. Ltd. , JSR Corporation, DuPont, Shin-Etsu Chemical Co. Ltd. , Sumitomo Chemical Co. Ltd. , Fujifilm ...

EUV Photoresist Pioneer Inpria Raises $31 Million in Series C Funding Led by JSR Corporation Expanded Investor Group Reflects Growing Industry Support February 20, 2020 07:00 AM Eastern Standard Time ...

The North America photoresist and photoresist ancillaries market was valued at US$ 666. 7 million in 2018 and is expected to grow at a CAGR of 6. 0% from 2019 to 2027 to reach US$ 1,128. 5 million ...

Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in ...