The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...

In any case, time is running out. Chartered, IBM and Samsung announced this week that they had released their initial process design kit for 45 nm. It’s not clear what that means either, exactly, ...

Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure ...

To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...

A new publication from Opto-Electronic Sciences; DOI 10.29026/oes.2024.230035, discusses supercritical metalens for photolithography.

Industry experts from the design, photolithography, test and measurement, and packaging communities gathered at this year’s SEMICON West and DAC to discuss product roadmaps for extreme ultraviolet ...

The metalens itself is fabricated using nanoimprint lithography, a scalable and cost-effective method, followed by atomic layer deposition, allowing for large-scale production of these lenses. The ...

Canon has announced a new nanoimprint lithography system that it says can transfer circuit patterns equivalent to those created by 5nm EUV photolith Tuesday, 02 January 2024 12:17 GMT عربي ...

NVIDIA is now far and away the AI processing leader, and it could be setting itself up for similar dominance in semiconductor manufacturing infrastructure as well.

The first lithography tools were fairly simple, but the technologies that produce today’s chips are among humankind’s most complex inventions. When we talk about computing these days, we tend ...

Direct write e-beam lithography has long been used by photomask shops, where it is justified by the need for near-perfection in high-precision “tooling.” The advantages of maskless lithography are ...