The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...

In any case, time is running out. Chartered, IBM and Samsung announced this week that they had released their initial process design kit for 45 nm. It’s not clear what that means either, exactly, ...

To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...

Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure ...

A new publication from Opto-Electronic Sciences; DOI 10.29026/oes.2024.230035, discusses supercritical metalens for photolithography.

Chip manufacturers currently make integrated circuits by shining light through a stencil or “mask” of the circuit design, passing this light through a series of lenses to reduce the size of the image, ...

The metalens itself is fabricated using nanoimprint lithography, a scalable and cost-effective method, followed by atomic layer deposition, allowing for large-scale production of these lenses. The ...

NVIDIA is now far and away the AI processing leader, and it could be setting itself up for similar dominance in semiconductor manufacturing infrastructure as well.

The first lithography tools were fairly simple, but the technologies that produce today’s chips are among humankind’s most complex inventions. When we talk about computing these days, we tend ...

Direct write e-beam lithography has long been used by photomask shops, where it is justified by the need for near-perfection in high-precision “tooling.” The advantages of maskless lithography are ...