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Abstract: We demonstrate a HfZrO 2 (HZO) ferroelectric field-effect transistor fabricated on a silicon-on-insulator substrate, targeting MHz synaptic device applications. Stable multistate weights ...
A new technical paper titled “Enabling static random-access memory cell scaling with monolithic 3D integration of 2D ...
Materials Research Institute and School of Physics and Astronomy, Queen Mary University of London, Mile End Road, E1 4NS London, U.K. Materials Research Institute and School of Physics and Astronomy, ...
Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan Article Views are the COUNTER-compliant sum of full text article downloads since ...
Abstract: A new technique for etching boron-doped homoepitaxial diamond films was used to fabricate mesa-isolated recessed gate field-effect transistors that operate at temperatures up to 350 degrees ...
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