In a preprint paper shared via the arXiv, scientists in Slovenia announce that they managed to 3D print a tiny elephant ...

No cleanroom, no photomask—just precision optics and photoresist. This DIY method brings semiconductor-scale patterning into ...

For the first time, scientists have 3-D printed objects within living cells, including a 10-micrometer long elephant and tiny “barcodes” that could help track individual cells. Remarkably, many of the ...

Major players in the photoresist & photoresist ancillaries market are Tokyo Ohka Kogyo Co. Ltd. , JSR Corporation, DuPont, Shin-Etsu Chemical Co. Ltd. , Sumitomo Chemical Co. Ltd. , Fujifilm ...

Major players in the photoresist & photoresist ancillaries market are Tokyo Ohka Kogyo Co. Ltd. , JSR Corporation, DuPont, Shin-Etsu Chemical Co. Ltd. , Sumitomo Chemical Co. Ltd. , Fujifilm ...

The photoresist and photoresist ancillaries market is driven by semiconductor industry growth, technological advancements such as the development of smaller feature sizes, new lithographic ...

Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in ...

Further, he reminded he is no stranger to the photoresist arena — he’s been focusing on stochastic modeling for resists for 8 years — and has been very disappointed at the rate of progress in the ...

They need to analyze all the steps following photolithography to understand how small changes in the photoresist shape will modify their pattern. This prior February, I gave a presentation on how ...

Graphene has been patterned in high-resolution and at the micron-scale with a laser and photoresist, an advance that could lead to applications in consumer electronics. This is the claim of a Rice ...

EUV Photoresist Pioneer Inpria Raises $31 Million in Series C Funding Led by JSR Corporation Expanded Investor Group Reflects Growing Industry Support February 20, 2020 07:00 AM Eastern Standard Time ...

Asahi Kasei has developed the Sunfort TA series of dry film photoresist for next-generation semiconductor packages requiring circuit patterns with line/space widths of 2/2 µm or less. The film offers ...