The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...

To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...

Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure ...

In any case, time is running out. Chartered, IBM and Samsung announced this week that they had released their initial process design kit for 45 nm. It’s not clear what that means either, exactly, ...

A new publication from Opto-Electronic Sciences; DOI 10.29026/oes.2024.230035, discusses supercritical metalens for photolithography.

Lithography nanopatterning expands traditional lithographic techniques into the ... CA are also better than previous resists when it comes to being more flexible in design and ... (NA) of the lens.

ASML's strong financials, high ROIC, and a unique competitive edge suggest the stock is undervalued by ~13%. Click to read ...

Chip manufacturers currently make integrated circuits by shining light through a stencil or “mask” of the circuit design, passing this light through a series of lenses to reduce the size of the image, ...

Thanks to a joint effort, an immersion lithography tool with an ultra-high numerical aperture (NA = 1.3) and 193-nm wavelength is on the horizon. Exitech's MS-193i microexposure device will help ...

NVIDIA is now far and away the AI processing leader, and it could be setting itself up for similar dominance in semiconductor manufacturing infrastructure as well.