The single-wafer spin processor is capable of handling up to 200 substrates per hour. “This is SEZ's first pure cleaning tool and gives the company entry into the over $1 billion market for wet ...

The following executive comment was provided by Scott Becker, vice president of product management of FSI International Inc.'s Surface Conditioning Division. Based in Minneapolis, FSI International is ...

TAZMO Co., Ltd. and Silecs, Inc. announced today that the companies have completed the installation of TAZMO’s Spin Coating System at TAZMO and Silecs Expand Collaboration on Wafer Processing Tools ...

Japanese semiconductor wafer cleaning equipment leader Screen has completed construction of a new factory at its existing facility in Shiga Prefecture, Japan, and officially began production in ...

* Mitsubishi gas chemical to build two new American plants by 2019 that will double co's U.S. Output of a chemical used to clean semiconductor wafers Sign up here. * Mitsubishi gas chemical co ...