The STAR Act extends the semiconductor manufacturing tax credit beyond 2026 and expands it to include research and ...
FinFETs form the foundation for many of today’s semiconductor fabrication techniques but also create significant design concerns that affect your layout. Understanding the changes and design ...
The Semiconductor Industry Association (SIA) today released the following statement from SIA President and CEO John Neuffer commending the introduction in the U.S. House of Representatives of the ...
often used in layout decomposition. Etch Bias: The difference between the intended design dimensions and the actual dimensions after the etching process in semiconductor manufacturing. This Nature ...
Fig.2. Failure analysis methodologies used in IC development (a) (b) [1] JCH Phang, DSH Chan, M. Palaniappan, JM Chin, B. Davis, M Bruce, “A review of Laser Induced Techniques for Microelectronic ...
Drain-to-Drain Abutment (DDA): A design constraint in semiconductor layouts that requires careful placement of cells to avoid interference between adjacent drains in FinFET structures. Interdie ...