Figure 1: Main steps of FinFET process flow Figure 2: Device structure with metal fill Let’s take a closer look at the fabrication process. Figure 3(a) shows the source drain profile prior to any SiGe ...

The gate-all-around (GAA) semiconductor manufacturing ... carrying capacity than FinFET, which requires putting multiple vertical “fins” beside one another to increase the flow of electricity. Figure ...

Unbalanced spaces between fins lead to undesired variability for subsequent etch or deposition steps. In this paper we propose a method to characterize the fin pitch walk by modeling the SAQP process ...

Through tight collaboration with Cadence, Samsung offers a full RTL-to-signoff flow that is power ... supporting Samsung's 14nm FinFET process technology with its Manufacturing Analysis and ...

Mentor Graphics Tools Included in TSMC's Reference Flow for 16nm FinFET Process Technology WILSONVILLE ... digital tool set for TSMC's 16nm FinFET manufacturing processes. TSMC's 16nm Reference ...

CFET fabrication is challenging due to the nMOS-pMOS vertically stacked structure, and we are in the early stages of pathfinding. Several flavors of CFETs have been proposed, including monolithic and ...

Intel presented more details regarding its 10nm FinFET manufacturing process. In the presentation materials, Intel highlighted some of the major improvements that its 10nm FinFET process will bring.

A Monday morning report from the Republic of China indicated that Taiwan Semiconductor Manufacturing Company is in the process of accelerating the rollout of its new 16-nanometer FinFET ...

Mentor Graphics Tools Included in TSMC's Reference Flow ... Process Technology WILSONVILLE, Ore.--(BUSINESS WIRE)-- Mentor Graphics Corp. (NAS: MENT) today announced that it has completed enhancements ...

WILSONVILLE, USA: Mentor Graphics Corp. has completed enhancements to its digital tool set for TSMC's 16nm FinFET manufacturing processes. TSMC's 16nm Reference Flow includes new capabilities for ...