Figure 1: Main steps of FinFET process flow Figure 2: Device structure with metal fill Let’s take a closer look at the fabrication process. Figure 3(a) shows the source drain profile prior to any SiGe ...

The gate-all-around (GAA) semiconductor manufacturing ... carrying capacity than FinFET, which requires putting multiple vertical “fins” beside one another to increase the flow of electricity. Figure ...

Unbalanced spaces between fins lead to undesired variability for subsequent etch or deposition steps. In this paper we propose a method to characterize the fin pitch walk by modeling the SAQP process ...

Mentor Graphics Tools Included in TSMC's Reference Flow for 16nm FinFET Process Technology WILSONVILLE ... digital tool set for TSMC's 16nm FinFET manufacturing processes. TSMC's 16nm Reference ...

CFET fabrication is challenging due to the nMOS-pMOS vertically stacked structure, and we are in the early stages of pathfinding. Several flavors of CFETs have been proposed, including monolithic and ...

The initial production ramp of 7LP will be based on optical lithography, with migration to EUV when the technology is ready for volume manufacturing. Meanwhile, GF has also announced FX-7, an ASIC ...

Intel presented more details regarding its 10nm FinFET manufacturing process. In the presentation materials, Intel highlighted some of the major improvements that its 10nm FinFET process will bring.

So, it would really be surprising if both the mid-range Snapdragon 620 and the flagship high-end Snapdragon 820 use the same 14nm FinFet manufacturing process. However, our source claims that ...

A Monday morning report from the Republic of China indicated that Taiwan Semiconductor Manufacturing Company is in the process of accelerating the rollout of its new 16-nanometer FinFET ...

WILSONVILLE, USA: Mentor Graphics Corp. has completed enhancements to its digital tool set for TSMC's 16nm FinFET manufacturing processes. TSMC's 16nm Reference Flow includes new capabilities for ...